High temperature behavior of arc evaporated ZrAlN and TiAlN thin films

نویسنده

  • Lina Rogström
چکیده

Hard coatings can extend the life time of a tool substantially and enable higher cutting speeds which increase the productivity in the cutting application. The aim with this thesis is to extend the understanding on how the microstructure and mechanical properties are affected by high temperatures similar to what a cutting tool can reach during operation. Thin films of ZrAlN and TiAlN have been deposited using cathodic arc-evaporation. The microstructure of as-deposited and annealed films has been studied using electron microscopy and x-ray scattering. The thermal stability has been characterized by calorimetry and thermogravity and the mechanical properties have been investigated by nanoindentation. The microstructure of Zr1−xAlxN thin films was studied as a function of composition, deposition conditions, and annealing temperature. The structure was found to depend on the Al content where a low (x < 0.38) Al-content results in cubic-structured ZrAlN while for x > 0.70 the structure is hexagonal. For intermediate Al contents (0.38 < x < 0.70), a nanocomposite structure with a mixture of cubic, hexagonal and amorphous phases is obtained. The cubic ZrAlN phase transforms by nucleation and growth of hexagonal AlN when annealed above 900 ◦C. Annealing of hexagonal ZrAlN thin films (x > 0.70) above 900 ◦C causes formation of AlN and ZrN rich domains within the hexagonal lattice. Annealing of nanocomposite ZrAlN thin films results in formation of cubic ZrN and hexagonal AlN. The transformation is initiated by nucleation and growth of cubic ZrN at temperatures of 1100 ◦C while the AlN-rich domains are still amorphous or nanocrystalline. Growth of hexagonal AlN is suppressed by the high nitrogen content of the films and takes place at annealing temperatures of 1400 ◦C. In the more well known TiAlN system, the initial stage of decomposition is spinodal with formation of cubic structured domains enriched in TiN and AlN. By a combination of in-situ x-ray scattering techniques during annealing and phase field simulations, both the microstructure that evolves during decomposition and the decomposition rate are found to depend on the composition. The results further show that early formation of hexagonal AlN domains during decomposition can cause formation of strains in the cubic TiAlN phase.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Wear behavior of ZrAlN coated cutting tools during turning

In this study we explore the cutting performance of ZrAlN coatings. WC:Co cutting inserts coated by cathodic arc evaporated Zr1-xAlxN coatings with x between 0 and 0.83 were tested in a longitudinal turning operation. The progress of wear was studied by optical microscopy and the used inserts were studied by electron microscopy. The cutting performance was correlated to the coating composition ...

متن کامل

Thermal Annealing Influence over Optical Properties of Thermally Evaporated SnS/CdS Bilayer Thin Films

Thin films of tin sulfide/cadmium sulfide (SnS/CdS) were prepared bythermal evaporation method at room temperature on a glass substrate and then annealedat different temperature with the aim of optimizing the optical properties of the materialfor use in photovoltaic solar cell devices. The effect of annealing on optical propertiesof SnS/CdS film was studied in the temper...

متن کامل

Investigation of Physical Properties of e-Beam Evaporated CdTe Thin Films for Photovoltaic Application

CdTe thin films with 2.8 µm thickness were deposited by electron beam evaporation method. X-ray diffraction, scanning electron microscopy, UV-Vis-NIR spectroscopy and atomic force microscopy (AFM) were used to characterize the films. The results of AFM analysis revealed that the CdTe films have uniform surface. CdTe thin films were heat-treated by SnCl2 solution. Structural analysis using XRD s...

متن کامل

Optimization of the Adhesion Strength of Arc Ion Plating TiAlN Films by the Taguchi Method

A three-level six-factor (arc power, substrate temperature, pre-treatment bias voltage, working pressure, deposition bias voltage and pretreatment time) orthogonal experimental array (L18) to optimize the adhesion strength of arc ion plating (AIP) TiAlN films was designed using the Taguchi method. An optimized film process, namely substrate temperature 220 °C, arc power 60 A, negative bias volt...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2012